Process proximity correction by neural networks

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3908-3912

  Jeon, Kyoung Ah ^a   Yoo, Ji Yong ^a   Park, Jun Taek ^a   Kim, Hyeongsoo ^a,b   An, Ilsin ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

Lithography; Neural networks; Process proximity correction; Simulation

Indexed keywords

ALGORITHMS; BRAIN; COMPUTER SIMULATION; LITHOGRAPHY;

PROCESS PROXIMITY CORRECTION;

NEURAL NETWORKS;

EID: 0041360610     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3908     Document Type: Conference Paper

References (2)

1. Z. Nami; IEEE Trans. Semicond. Manufact. 10 (1997) 288.
2. L. Cazzanti, M. Khan and F. Cerrina: Proc. SPIE 3332 (1997) 664.