Lithography process optimization simulator for an illumination system

Journal of the Korean Physical Society

Volumn 42, Issue SPEC., 2003, Pages

  Ha, Mi Ae ^a   Sohn, Dong Soo ^a   Yoo, Ji Yong ^a   An, Ilsin ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Critical dimension(CD); Illumination condition; Optical proximity correction(OPC)

Indexed keywords

EID: 0037306965     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (5)

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5. J. Y. Yoo, Y.-K. Kwon, J.-T. Park, D.-S. Sohn, S.-G. Kim, Y.-S. Sohn, and H-K. Oh, Proc. SPIE 4691 (2002).