A study of process parameter control for nanopattern

Journal of the Korean Physical Society

Volumn 45, Issue SUPPL., 2004, Pages

  Kim, Sang Kon ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Chemically amplified resist; Lithography; Lithography simulation; Mask error enhancement factor; Optical proximity correction

Indexed keywords

EID: 12744250273     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (7)

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