Post exposure bake effect in 193 nm chemically amplified resist

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 4, 1999, Pages

  Oh, Hye Keun ^a   Sohn, Young Soo ^a   Sung, Moon Gyu ^a   Lee, Young Mi ^a   Lee, Eun Mi ^a   An, Ilsin ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033273371     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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