Extraction of Exposure Parameters for 193-nm Chemically Amplified Resist and Its Application to Simulation

Journal of the Korean Physical Society

Volumn 39, Issue 1, 2001, Pages 152-156

  Sohn, Young Soo ^a   Lee, Eun Mi ^a   Sung, Moon Gyu ^a   Lee, Young Mi ^a   Bak, Heung Jin ^a   An, Ilsin ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035600804     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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