Formation and rate processes of y2O3 stabilized ZrO2 thin films from Zr(DPM)4 and Y(DPM)3 by cold-wall aerosol-assisted MOCVD

Journal of the Electrochemical Society

Volumn 152, Issue 7, 2005, Pages

  Jiang, Yinzhu ^a   Song, Haizheng ^a   Gao, Jianfeng ^a   Meng, Guangyao ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; CHELATION; COATINGS; CONCENTRATION (PROCESS); FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA SPRAYING; POLYCRYSTALLINE MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

AEROSOL-ASSISTED MOCVD; DEPOSITION TEMPERATURE; POLYCRYSTALLINE SUBSTRATES; RATE PROCESSES;

THIN FILMS;

EID: 23744446721     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1921674     Document Type: Article

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