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Volumn 241, Issue 3, 2002, Pages 352-362
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Macro- and micro-scale simulation of growth rate and composition in MOCVD of yttria-stabilized zirconia
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Author keywords
A1. Computer simulation; A1. Growth models; A1. Mass transfer; A3. Metalorganic chemical vapour deposition; A3. Polycrystalline deposition; B1. Oxides; B1. Yttrium compounds
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Indexed keywords
COMPLEXATION;
COMPUTER SIMULATION;
HIGH TEMPERATURE EFFECTS;
MASS TRANSFER;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SURFACE REACTIONS;
THIN FILMS;
YTTRIUM COMPOUNDS;
ZIRCONIA;
GAS PHASE;
FILM GROWTH;
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EID: 0036606109
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(02)01318-0 Document Type: Article |
Times cited : (28)
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References (17)
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