Deposition of Y2O3 stabilized ZrO2 thin films from Zr(DPM)4 and Y(DPM)3 by aerosol-assisted MOCVD

Materials Letters

Volumn 57, Issue 24-25, 2003, Pages 3833-3838

  Song, Haizheng ^a   Xia, Changrong ^a   Jiang, Yinzhu ^a   Meng, Guangyao ^a   Peng, Dingkun ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Aerosol; MOCVD; Thin films; Y2O3 stabilized ZrO2

Indexed keywords

ACTIVATION ENERGY; AEROSOLS; AMORPHOUS MATERIALS; ANNEALING; CHELATION; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; ELECTROCHEMISTRY; HIGH TEMPERATURE EFFECTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; POLYCRYSTALLINE MATERIALS; SUBSTRATES; YTTRIUM COMPOUNDS; ZIRCONIA;

ELECTROCHEMICAL CELLS;

THIN FILMS;

EID: 0042562032     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(03)00187-3     Document Type: Article

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