Ultraflat Carbon Film Electrodes Prepared by Electron Beam Evaporation

Analytical Chemistry

Volumn 76, Issue 9, 2004, Pages 2544-2552

  Blackstock, Jason J ^a   Rostami, Abbas A ^a,c   Nowak, Aletha M ^b   McCreery, Richard L ^b   Freeman, Mark R ^a   McDermott, Mark T ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

^b OHIO STATE UNIVERSITY   (United States)

^c UNIVERSITY OF MAZANDARAN   (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; DEPOSITION; ELECTRON BEAMS; EVAPORATION; MOLECULAR DYNAMICS; PYROLYSIS; RAMAN SPECTROSCOPY; RATE CONSTANTS; SILICON; THIN FILMS;

MOLECULAR ELECTRONICS; ROOT-MEAN-SQUARE ROUGHNESS; SCANNING FORCE MICROSCOPY;

ELECTRODES;

CARBON; SILICON;

ADSORPTION; ANALYTIC METHOD; ARTICLE; ELECTROCHEMICAL ANALYSIS; ELECTRODE; ELECTRON BEAM; ELECTRON TRANSPORT; EVAPORATION; FILM; PYROLYSIS; RAMAN SPECTROMETRY; SCANNING ELECTRON MICROSCOPY; STRUCTURE ANALYSIS;

EID: 2342614817     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac035003j     Document Type: Article

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