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Volumn 68, Issue 11, 1996, Pages 1858-1864

Fabrication and characterization of sputtered-carbon microelectrode arrays

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; CROSSTALK; CYCLIC VOLTAMMETRY; DIELECTRIC PROPERTIES OF SOLIDS; ELECTRIC IMPEDANCE; ELECTROCHEMISTRY; INTEGRATED CIRCUIT MANUFACTURE; MICROMACHINING; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THIN FILM DEVICES;

EID: 0030165549     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac9508816     Document Type: Article
Times cited : (86)

References (40)
  • 25
    • 85033823370 scopus 로고    scopus 로고
    • In this article, the array of electrodes is sometimes referred to as the microprobe, and each electrode in the array is referred to as a site
    • In this article, the array of electrodes is sometimes referred to as the microprobe, and each electrode in the array is referred to as a site.
  • 40
    • 85033825668 scopus 로고
    • Detection limit is calculated at a S/N ratio of 3 from the software: Rocky Mountain Center for Sensor Technology, Denver, CO.
    • Detection limit is calculated at a S/N ratio of 3 from the software: IVEC Manual; Rocky Mountain Center for Sensor Technology, Denver, CO. 1993.
    • (1993) IVEC Manual


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.