A different regime of nanostructured diamond film growth

Journal of Nanoscience and Nanotechnology

Volumn 3, Issue 6, 2003, Pages 521-524

  Sharda, Tarun ^a   Soga, Tetsuo ^b  

^a Seki Technotron Corp   (Japan)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Film Growth; HRTEM; Microwave Plasma CVD; Nanocrystalline Diamond

Indexed keywords

CARBON; DIAMOND;

ARTICLE; CHEMICAL PROCEDURES; CRYSTAL STRUCTURE; FILM; MICROWAVE RADIATION; NANOPARTICLE; NANOTECHNOLOGY; PHYSICAL CHEMISTRY; TRANSMISSION ELECTRON MICROSCOPY; VAPOR;

ADSORPTION; DIAMOND; GASES; HARDNESS; MATERIALS TESTING; MICROWAVES; MOLECULAR CONFORMATION; NANOTECHNOLOGY; NANOTUBES; PARTICLE SIZE; PRESSURE; STRESS, MECHANICAL; SURFACE PROPERTIES;

EID: 2342604436     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2003.232     Document Type: Article

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