Low temperature plasma process based on CO-rich CO/H2 mixtures for high rate diamond film deposition

Applied Physics Letters

Volumn 70, Issue 12, 1997, Pages 1527-1529

  Lee, Joungchel ^a,c   Collins, R W ^a,c   Messier, R ^a,c   Strausser, Y E ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b Digital Instruments   (United States)

^c Department of Physics ^*

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003937834     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118607     Document Type: Article

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