Photoablation characteristics of novel polyimides synthesized for high-aspect-ratio excimer laser LIGA process

Journal of Micromechanics and Microengineering

Volumn 14, Issue 4, 2004, Pages 480-489

  Yang, Chii Rong ^a   Hsieh, Yu Sheng ^b   Hwang, Guang Yeu ^c   Lee, Yu Der ^c  

^a NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTROPLATING; ETCHING; KRYPTON; LASER ABLATION; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; POLYCONDENSATION; POLYIMIDES; STRUCTURE (COMPOSITION); SYNTHESIS (CHEMICAL);

ETCHING RATES; PHOTOABLATION; PHOTOTHERMAL MECHANISM; SURFACE ABLATION;

EXCIMER LASERS;

EID: 2342475753     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/14/4/007     Document Type: Article

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