Laminated dry film resist for microengineering applications

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 365-368

  Zhu, J ^a   Holmes, A S ^b   Arnold, J ^c   Lawes, R A ^a   Prewett, P D ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

^c INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; EXCIMER LASERS; LAMINATES; LASER ABLATION; MICROSTRUCTURE; REACTIVE ION ETCHING; THREE DIMENSIONAL;

DRY FILM RESIST; EXCIMER LASER ABLATION; MICROENGINEERING APPLICATIONS; PLANARIZATION;

PHOTORESISTS;

EID: 0029753205     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00265-0     Document Type: Article

References (7)

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