Multilevel diffractive optical element manufacture by excimer laser ablation and halftone masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4274, Issue , 2001, Pages 420-431

  Quentel, F ^a   Fieret, J ^b   Holmes, A S ^c   Paineau, S ^a  

^a THALES   (France)

^b Exitech Ltd   (United Kingdom)

^c IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

3D Micromachining; Diffractive optical elements; Excimer laser ablation; Halftone mask

Indexed keywords

ABLATION; CALIBRATION; DENSITY (OPTICAL); DIFFRACTIVE OPTICAL ELEMENTS; EXCIMER LASERS; ITERATIVE METHODS; LASER ABLATION; LASER APPLICATIONS; MICROELECTRONICS; POLYMERS;

DESIGN PROCEDURE; FOURIER COMPUTER-GENERATED HOLOGRAMS; HALFTONE MASKS; HIGH-PRECISION MOTION; ITERATIVE FOURIER TRANSFORM ALGORITHMS; KRF EXCIMER LASER; PIXEL DIMENSION; SPATIAL VARIATIONS;

PIXELS;

EID: 85076782811     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.432538     Document Type: Conference Paper

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