Poly[(cis-3-(ethanesulfonyloxy)-2-pinanyl methacrylate)-co-(tert-butyl methacrylate)] as an acid-amplifying photoresist

Macromolecular Rapid Communications

Volumn 21, Issue 15, 2000, Pages 1050-1053

  Park, Sang Wook ^a   Arimitsu, Koji ^a   Ichimura, Kunihiro ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 23044522731     PISSN: 10221336     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3927(20001001)21:15<1050::AID-MARC1050>3.0.CO;2-V     Document Type: Article

References (19)

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