Acid Proliferation Reactions and Their Application to Chemically Amplified Lithographic Imaging

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 161-171

  Ichimura, Kunihiro ^a   Arimitsu, Koji ^a   Noguchi, Soh ^a   Kudo, Kazuaki ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042414147     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1998-0706.ch013     Document Type: Article

References (10)

1. Reichmanis, E. In Polymers for Electronic and Photonic Applications; Wong, C. P., Ed.; Academic Press: San Diego, 1993, pp 67-117.
2. Ichimura, K.; Arimitsu, K.; Kudo, K. Chem. Lett. 1995, 551; Arimitsu, K.; Kudo, K.; Ichimura, K. J. Am. Chem. Soc. in press.
3. Ichimura, K.; Arimitsu, K.; Kudo, K. Chem. Lett. 1995, 551; Arimitsu, K.; Kudo, K.; Ichimura, K. J. Am. Chem. Soc. in press.
4. a) US 5,441,850 (Aug. 15, 1995; Polaroid Co.);
5. b) 5,534,388 (Jul. 9, 1996; Polaroid Co.).
6. Nenitzescu, C. D.; Ioan, V.; Teodorescu, L. Chem. Ber. 1957, 90, 585.
7. Ichimura, K.; Itoh, H. unpublished results.
8. Kudo, K.; Arimitsu, K.; Ichimura, K. Mol. Cryst. Liq. Cryst. 1996, 280, 307.
9. Ito, H.; Willson, C. G.; Frechet, J. M. J. Digest of Technical Papers of 1982 Symposium on VLSI Technology, 1982, 86.
10. Ohfuji, T.; Takahashi, M.; Sasago, M.; Noguchi, S.; Ichimura, K. J. Photopolym. Sci. Technol. 1997, 10, 551.