Nanoscale patterning of Zr-Al-Cu-Ni metallic glass thin films deposited by magnetron sputtering

Journal of Nanoscience and Nanotechnology

Volumn 5, Issue 3, 2005, Pages 416-420

  Sharma, Parmanand ^a   Zhang, Wei ^a,c   Amiya, Kenji ^b   Kimura, Hisamichi ^c   Inoue, Akihisa ^c  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b RandD Institute Metals and Composites for Future Industries   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Focused ion beam etching; Metallic glass thin films; Nanomolds; Nanopatterning; Sputtering; Zr Al Cu Ni

Indexed keywords

FOCUSED ION BEAM ETCHING; METALLIC GLASS THIN FILMS; NANOMOLDS; NANOPATTERNING; ZR-AL-CU-NI;

ALUMINUM COMPOUNDS; LITHOGRAPHY; MAGNETRON SPUTTERING; THIN FILMS; ZIRCONIUM COMPOUNDS;

NANOSTRUCTURED MATERIALS;

ALUMINUM; COPPER; GLASS; METAL; NANOMATERIAL; NICKEL; ZIRCONIUM;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CRYSTALLIZATION; INSTRUMENTATION; MAGNETISM; MATERIALS; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; SURFACE PROPERTY; ULTRASTRUCTURE;

ALUMINUM; COPPER; CRYSTALLIZATION; GLASS; MAGNETICS; MANUFACTURED MATERIALS; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; METALS; NANOSTRUCTURES; NANOTECHNOLOGY; NICKEL; SURFACE PROPERTIES; ZIRCONIUM;

EID: 22844449697     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2005.055     Document Type: Article

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