Simple nanostructuring on silicon surface by means of focused beam patterning and wet etching

Applied Surface Science

Volumn 162, Issue , 2000, Pages 599-603

  Koh, M ^a   Sawara, S ^a   Shinada, T ^a   Goto, T ^a   Ando, Y ^a   Ohdomari, I ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ETCHING; ION BEAM LITHOGRAPHY; SEMICONDUCTING SILICON; SILICA; SURFACE STRUCTURE;

FOCUSED ION BEAMS; HYDRAZINE; NANOPYRAMID ARRAY; NANOSTRUCTURING; WET ETCHING;

NANOSTRUCTURED MATERIALS;

EID: 0034247763     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00257-9     Document Type: Article

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