A kinetic model of diamond nucleation and silicon carbide interlayer formation during chemical vapor deposition

Diamond and Related Materials

Volumn 14, Issue 8, 2005, Pages 1377-1388

  Yun, Jungheum ^a,b   Dandy, David S ^a  

^a Engineering Research Center and Hydraulics Laboratory   (United States)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Adsorption energy; Chemical vapor deposition; Diamond; Intermediate layer; Nucleation; Silicon carbide

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; GROWTH (MATERIALS); NUCLEATION; SILICON CARBIDE; THICKNESS MEASUREMENT;

ADSORPTION ENERGY; INTERLAYER FORMATION; INTERMEDIATE LAYER; OPERATING CONDITIONS;

DIAMONDS;

EID: 22844442677     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.02.008     Document Type: Conference Paper

References (94)

1. J. Singh J. Mater. Sci. 29 1994 2761
2. K.V. Ravi, and C.A. Koch Appl. Phys. Lett. 57 1990 348
3. K.V. Ravi J. Mater. Res. 7 1992 384
4. C. Trevor, D. Cherns, and P. Southworth F.J. Humphreys Proceedings of Institute Physics, Electron Microscopy and Analysis Group Conference 1991 IOP Bristol, UK 275
5. J.J. Dubray, C.G. Pantano, M. Meloncelli, and E. Bertran J. Vac. Sci. Technol., A, Vac. Surf. Films 9 1991 3012
6. K. Tamaki, Y. Watanabe, Y. Nakamura, and S. Hirayama Thin Solid Films 236 1993 115
7. P.N. Barnes, and R.L.C. Wu Appl. Phys. Lett. 62 1993 37
8. R. Csencsits, J. Rankin, R.E. Boekenhauer, M.K. Kundmann, and B.W. Sheldon H.A. Atwater E. Chason M.H. Grabow M.G. Lagally Evolution of Surface and Thin Film Microstructure Symposium 1993 M.R.S. Pittsburgh, PA 695
9. A.A. Smolin, S.M. Pimenov, V.G. Ralchenko, T.V. Kononenko, V.I. Konov, and E.N. Loubnin Diam. Films Technol. 3 1993 1
10. D.N. Belton, and S.J. Schmieg Thin Solid Films 212 1992 68
11. T.P. Ong, F. Xiong, R.P.H. Chang, and C.W. White J. Mater. Res. 7 1992 2429
12. W.R.L. Lambrecht, C.H. Lee, B. Segall, J.C. Angus, Z. Li, and M. Sunkara Nature 364 1993 607
13. X. Peng, and H. Li Mater. Lett. 17 1993 223
14. R. Meilunas, M.S. Wong, K.C. Sheng, R.P.H. Chang, and R.P. VanDuyne Appl. Phys. Lett. 54 1989 2204
15. A.R. Badzian, and T. Badzian Surf. Coat. Technol. 36 1988 283
16. B.E. Williams, and J.T. Glass J. Mater. Res. 4 1989 373
17. D.N. Belton, S.J. Harris, S.J. Schmieg, A.M. Weiner, and T.A. Perry Appl. Phys. Lett. 54 1989 416
18. B.E. Williams, J.T. Glass, R.F. Davis, and K. Kobashi J. Cryst. Growth 99 1990 1168
19. S. Yugo, T. Kimura, and T. Muto Vacuum 41 1990 1364
20. B.R. Stoner, G.H.M. Ma, S.D. Wolter, and J.T. Glass Phys. Rev., B 45 1992 11067
21. S.D. Wolter, B.R. Stoner, G.H.M. Ma, and J.T. Glass C.L. Renschler J.J. Pouch D.M. Cox Novel Forms of Carbon Symposium 1992 M.R.S. Pittsburgh, PA 347
22. Y.H. Shing, F.S. Pool, and D.H. Rich Thin Solid Films 212 1992 150
23. B.R. Stoner, S.R. Sahaida, J.P. Bade, P. Southworth, and P.J. Ellis J. Mater. Res. 8 1993 1334
24. D. Kim, H. Lee, and J. Lee J. Mater. Sci. 28 1993 6704
25. E.G. Wang Physica. B 185 1993 85
26. G.A. Hirata, L. Cota-Araiza, M. Avalos-Borja, M.H. Farias, O. Contreras, and Y. Matsumoto J. Phys. 5 1993 A305
27. K. Kobayashi, N. Mutsukura, Y. Machi, and T. Nakano Diamond Relat. Mater. 2 1993 278
28. S.D. Wolter, B.R. Stoner, J.T. Glass, P.J. Ellis, D.S. Buhaenko, C.E. Jenkins, and P. Southworth Appl. Phys. Lett. 62 1993 1215
29. M.C. Polo, J. Cifre, and J. Esteve Diamond Relat. Mater. 3 1994 492
30. N. Jiang, B.W. Sun, Z. Zhang, and Z. Lin J. Mater. Res. 9 1994 2695
31. S.D. Wolter, J.T. Glass, and B.R. Stoner J. Appl. Phys. 77 1995 5119
32. T. Suesada, N. Nakamura, H. Nagasawa, and H. Kawarada Jpn. J. Appl. Phys. 34 1995 4898
33. Y. Ma, T. Tsurumi, N. Shinoda, and O. Fukunaga Diamond Relat. Mater. 4 1995 1325
34. Z. Sun, Y. Sun, X. Wang, and Z. Zheng Mater. Sci. Eng., B, Solid-state Mater. Adv. Technol. 34 1995 L13
35. G. Jubber, and D.K. Milne Phys. Status Solidi, Appl. Res. 154 1996 185
36. W. Kulisch, L. Ackermann, and B. Sobisch Phys. Status Solidi, Appl. Res. 154 1996 155
37. E.J. Corat, N.G. Ferreira, V.J. Trava-Airoldi, N.F. Leite, R.C. Mendes de Barros, and K. Iha J. Mater. Sci. Lett. 16 1997 197
38. L.C. Nistor, J.V. Landuyt, V.G. Ralchenko, E.D. Obraztsova, and A.A. Smolin Daimond Relat. Mater. 6 1997 159
39. S.B. Iyer, and S. Srinivas Thin Solid Films 305 1997 259
40. G. Sánchez, W.L. Wang, M.C. Polo, and J. Esteve Diamond Relat. Mater. 7 1998 200
41. M. Chiang, and M. Hon J. Cryst. Growth 211 2000 211
42. K.V. Ravi, C.A. Koch, H.S. Hu, and A. Joshi J. Mater. Res. 5 1990 2356
43. D. Michau, B. Tanguy, G. Demazeau, M. Couzi, and R. Cavagnat Diamond Relat. Mater. 2 1993 19
44. Z. Li, L. Wang, T. Suzuki, A. Argoitia, P. Pirouz, and J. Angus J. Appl. Phys. 73 1993 711
45. J.A. Baglio, B.C. Fransworth, S. Hankin, C. Sung, J. Hefter, and M. Tabasky R.E. Clausing L.L. Horton J.C. Angus P. Koidl Diamond and Diamond-like Films and Coatings 1991 Plenum Press New York 635
46. P. Mahalingam, and D.S. Dandy Thin Solid Films 322 1998 108
47. R. Haubner, and B. Lux Diamond Relat. Mater. 2 1993 1277
48. J. Graul, and E. Wagner Appl. Phys. Lett. 21 1972 67
49. C.J. Magab, and H.J. Leamy J. Appl. Phys. 45 1974 1075
50. A.J. Steckl, and J.P. Li Thin Solid Films 216 1992 149
51. J.P. Li, A.J. Steckl, I. Golecki, F. Reidinger, L. Wang, X.J. Ning, and P. Piroux Appl. Phys. Lett. 62 1993 3135
52. J.P. Li, and A.J. Steckl J. Electrochem. Soc. 142 1995 634
53. B. Bahavar, M.I. Chaudhry, and R.J. Mccluskey Appl. Phys. Lett. 63 1993 914
54. N. Bécourt, J.L. Ponthenier, A.M. Papon, and C. Jaussaud Physica. B 185 1993 79
55. G. Ferro, Y. Monteil, H. Vincent, V. Thevenot, M.D. Tran, F. Cauwet, and J. Bouix J. Appl. Phys. 80 1996 4691
56. G. Ferro, Y. Monteil, H. Vincent, F. Cauwet, J. Bouix, P. Durupt, J. Olivier, and R. Bisaro Thin Solid Films 278 1996 22
57. V. Cimalla, J. Pezoldt, G. Ecke, and G. Eichhorn Inst. Phys. Conf. Ser. 142 1996 153
58. H. Romanus, V. Cimalla, A. Kromka, J. Scheiner, L. Spieb, and J. Pezoldt Mater. Sci. Eng., B, Solid-state Mater. Adv. Technol. 47 1997 274
59. C. Bittencourt, M. De Seta, and F. Evangelisti J. Vac. Sci. Technol., B 16 1998 1599
60. C.A. Zorman, S. Roy, C.H. Wu, A.J. Fleischman, and M. Mehregany J. Mater. Res. 13 1998 406
61. C.D. Stinespring, and J.C. Wormhoudt J. Appl. Phys. 45 1974 1075
62. M. Tomellini, R. Polini, and V. Sessa J. Appl. Phys. 70 1991 7573
63. E. Molinari, R. Polini, M.L. Terranova, P. Ascarelli, and S. Fontana J. Mater. Res. 7 1992 1778
64. E. Molinari, R. Polini, V. Sessa, M.L. Terranova, and M. Tomellini J. Mater. Res. 8 1993 785
65. E. Molinari, R. Polini, and M. Tomellini J. Mater. Res. 8 1993 798
66. M. Tomellini J. Mater. Res. 8 1993 1596
67. H. Liu, and D.S. Dandy J. Electrochem. Soc. 143 1996 1104
68. M.H. Hon, and R.F. Davis J. Mater. Sci. 14 1979 2411
69. J.A. Venables Philos. Mag. 27 1973 697
70. P. Mahalingam, H. Liu, and D.S. Dandy J. Appl. Phys. 81 1997 1966
71. M. Ohring, The Materials Science of Thin Films, Academic Press, Harcourt Brace Jovanovich Pub., Boston, MA, 1992.
72. M.E. Coltrin, R.J. Kee, G.H. Evans, E. Meeks, F.H. Rupley, J.F. Grear, Report No. SAND 91-8003 (1991).
73. R.J. Kee, F.M. Rupley, J.A. Miller, Report No. SAND 89-8009B (1993).
74. M.E. Coltrin, R.J. Kee, F.M. Rupley, Report No. SAND 90-8003B (1991).
75. R.J. Kee, G. Dixon-Lewis, J. Warnatz, M.E. Coltrin, J.A. Miller, Report No. SAND 86-8246 (1986).
76. M.E. Coltrin, and D.S. Dandy J. Appl. Phys. 74 1993 5803
77. C.C. Battaile, D.J. Srolovitz, I.I. Oleinik, D.G. Pettifor, A.P. Sutton, S.J. Harris, and J.E. Butler J. Chem. Phys. 111 1999 4291
78. M.D. Allendorf, and R.J. Kee J. Electrochem. Soc. 138 1991 841
79. R.B. Jackman, L.H. Chua, and J.S. Ford Surf. Sci. 292 1993 47
80. K. Feng, Z.H. Liu, and Z. Lin Surf. Sci. 329 1995 77
81. A.J. Dyson, and P.V. Smith Surf. Sci. 396 1998 24
82. J.A. Venables, G.D.T. Spiller, and M. Hanbücken Rep. Prog. Phys. 47 1984 399
83. B. Lewis Thin Solid Films 1 1967 85
84. G. Zinsmeister Thin Solid Films 4 1969 363
85. B. Lewis, and D.S. Campbell J. Vac. Sci. Technol. 4 1967 209
86. J.C. Fisher J. Appl. Phys. 22 1951 74
87. T. Suzuoka J. Phys. Soc. Jpn. 19 1964 839
88. J. Crank, The Mathematics of Diffusion, Oxford University Press, Ely House, London, UK, 1975.
89. C. Wild, N. Herres, and P. Koidl J. Appl. Phys. 68 1990 973
90. C. Wild, P. Koidl, W. Muller-Sebert, H. Walcher, R. Kohl, N. Herres, R. Locher, R. Samlenski, and R. Brenn Diamond Relat. Mater. 2 1993 158
91. D.J. Srolovitz, D.S. Dandy, J.E. Bulter, C.C. Battaile, and F. Paritosh JOM 49 1997 42
92. D.S. Dandy, and M.E. Coltrin J. Appl. Phys. 76 1994 3102
93. Y.S. Cheng, C.H. Sho, and G.F. Shu J. Cryst. Growth 99 1990 1196
94. J.W. Kim, Y.J. Baik, and K.Y. Eun Y. Tzeng M. Yoshikawa A. Feldman Applications of Diamond Films and Related Materials 1991 Elsevier Science Pub. Amsterdam 399