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Thin Solid Films

Volumn 322, Issue 1-2, 1998, Pages 108-116

A quasi-equilibrium model for the prediction of interlayer chemistry during diamond chemical vapor deposition

(2) Mahalingam, Pushpa a Dandy, David S a

a Engineering Research Center and Hydraulics Laboratory (United States)

Author keywords

Chemical vapor deposition; Diamond films; Quasi equilibrium model

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DESORPTION; INTERFACES (MATERIALS); IRON; MATHEMATICAL MODELS; MOLYBDENUM; PHASE DIAGRAMS; SILICON; TANTALUM; THERMODYNAMICS; TITANIUM; TUNGSTEN;

INTERLAYER CHEMISTRY;

DIAMOND FILMS;

EID: 0032496537 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00966-8 Document Type: Article

Times cited : (8)

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