X-ray photoelectron spectroscopy investigation of substrate surface pretreatments for diamond nucleation by microwave plasma chemical vapor deposition

Journal of Crystal Growth

Volumn 211, Issue 1, 2000, Pages 211-215

  Chiang, Ming Jeng ^a   Hon, Min Hsiung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INORGANIC COMPOUNDS; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON; SILICON CARBIDE; SUBSTRATES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

DC BIASING; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; SCRATCHING; SUBSTRATE SURFACE PRETREATMENT; ULTRASONIC ABRASION;

DIAMOND FILMS;

EID: 0033891172     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00769-1     Document Type: Article

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