Progress towards developing high performance immersion compatible materials and processes

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 52-63

  Petrillo, Karen ^a   Patel, Kaushal ^a   Chen, Rex ^a   Li, Wenjie ^a   Kwong, Ranee ^a   Lawson, Peggy ^a   Varanasi, Rao ^a   Robinson, Chris ^a   Holmes, Steven ^a   Gil, Dario ^a   Kimmel, Kurt ^a   Slezak, Mark ^b   Dabbagh, Gary ^b   Chiba, Takashi ^b   Shimokawa, Tsutomu ^b  

^a IBM   (United States)

^b JSR Micro   (United States)

Author keywords

Defects; Immersion lithography; Photoresist; Top coat

Indexed keywords

DEFECT REDUCTION; IMMERSION LITHOGRAPHY; MATERIAL DEVELOPMENT CYCLE; TOP COAT;

CONTROL SYSTEM ANALYSIS; DATA REDUCTION; DEFECTS; DRYING; PHOTORESISTS; POLYMERS;

PHOTOLITHOGRAPHY;

EID: 22144458268     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601621     Document Type: Conference Paper

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