Reactive dissolution kinetics of lithographic copolymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 352-359

  Hinsberg, William ^a   Houle, Frances ^a   Ito, Hiroshi ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Critical ionization; Kinetics; Quartz crystal microbalance; Resist dissolution

Indexed keywords

CRITICAL IONIZATION; QUARTZ CRYSTAL MICROBALANCE; RESIST DISSOLUTION;

COMPOSITION; COPOLYMERS; CRYSTALS; DISSOLUTION; IONIZATION; LITHOGRAPHY; PLASTIC FILMS; QUARTZ; REACTION KINETICS;

PHOTORESISTS;

EID: 3843125195     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535599     Document Type: Conference Paper

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