Bias-induced forces in conducting atomic force microscopy and contact charging of organic monolayers

Ultramicroscopy

Volumn 92, Issue 2, 2002, Pages 67-76

  Cui, X D ^a   Zarate, X ^a   Tomfohr, J ^a   Primak, A ^a,b   Moore, A L ^a   Moore, T A ^a   Gust, D ^a   Harris, G ^b   Sankey, O F ^a   Lindsay, S M ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC FIELDS; ELECTROSTRICTION; INSULATING MATERIALS; MONOLAYERS; ORGANIC COMPOUNDS; STRESS ANALYSIS; SUBSTRATES;

BIAS-INDUCED FORCES; LONG-RANGE COULOMB ATTRACTION;

ATOMIC FORCE MICROSCOPY;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRICAL POTENTIAL PARAMETERS; MECHANICAL STRESS; SURFACE PROPERTY;

EID: 18444412909     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00069-4     Document Type: Article

References (33)