Atmospheric pressure chemical vapor deposition of TiN from tetrakis(dimethylamido)titanium and ammonia

Journal of Materials Research

Volumn 11, Issue 4, 1996, Pages 989-1001

  Musher, Joshua N ^a   Gordon, Roy G ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; AMMONIUM COMPOUNDS; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC RESISTANCE MEASUREMENT; FILM GROWTH; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

TETRAKIS(DIMETHYLAMIDO)TITANIUM;

TITANIUM NITRIDE;

EID: 0030129590     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0124     Document Type: Article

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