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Volumn 11, Issue 4, 1996, Pages 989-1001

Atmospheric pressure chemical vapor deposition of TiN from tetrakis(dimethylamido)titanium and ammonia

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; AMMONIUM COMPOUNDS; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC RESISTANCE MEASUREMENT; FILM GROWTH; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030129590     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0124     Document Type: Article
Times cited : (57)

References (36)
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    • Advanced Metallization and Processing for Semiconductor Devices and Circuits II, edited by A. Katz, S. P. Murarka, Y. I. Nissim, and J. M. E. Harper Pittsburgh, PA
    • I. J. Raaijmakers, R. N. Vrtis, J. Yang, S. Ramaswami, A. Lagendijk, D. A. Roberts, and E. K. Broadbent, in Advanced Metallization and Processing for Semiconductor Devices and Circuits II, edited by A. Katz, S. P. Murarka, Y. I. Nissim, and J. M. E. Harper (Mater. Res. Soc. Symp. Proc. 260, Pittsburgh, PA, 1993), p. 99.
    • (1993) Mater. Res. Soc. Symp. Proc. , vol.260 , pp. 99
    • Raaijmakers, I.J.1    Vrtis, R.N.2    Yang, J.3    Ramaswami, S.4    Lagendijk, A.5    Roberts, D.A.6    Broadbent, E.K.7
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    • Advanced Metallization and Processing for Semiconductor Devices and Circuits II, edited by A. Katz, S. P. Murarka, Y. I. Nissim, and J. M. E. Harper Pittsburgh, PA
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    • (1993) Mater. Res. Soc. Symp. Proc. , vol.260 , pp. 813
    • Chiang, S.1    Hendel, R.2    Zhang, F.3
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    • Chemical Vapor Deposition of Refractory Metals and Ceramics, edited by T. M. Besmann and B. M. Gallois Pittsburgh, PA
    • R. M. Fix, R. G. Gordon, and D. M. Hoffman, in Chemical Vapor Deposition of Refractory Metals and Ceramics, edited by T. M. Besmann and B. M. Gallois (Mater. Res. Soc. Symp. Proc. 168, Pittsburgh, PA, 1990), p. 357.
    • (1990) Mater. Res. Soc. Symp. Proc. , vol.168 , pp. 357
    • Fix, R.M.1    Gordon, R.G.2    Hoffman, D.M.3
  • 14
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    • Roberts, D.1
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    • J. A. Prybyla, C-M. Chiang, and L. Dubois, in Chemical Perspectives of Microelectronic Materials III, edited by C. R. Abernathy, C. W. Bates, D. A. Bohling, and W. S. Hobson (Mater. Res. Soc. Symp. Proc. 282, Pittsburgh, PA, 1993), p. 287.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.