Thick single crystal silicon MEMS with high aspect ratio vertical air-gaps

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5715, Issue , 2005, Pages 138-147

  Monajemi, Pejman ^a   Ayazi, Farrokh ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Accelerometer; Deep Reactive Ion Etching (DRIE); HARPSS; Low Pressure Chemical Vapor Deposition (LPCVD); Polysilicon (poly); Single Crystal Silicon (SCS); Tunable capacitor; Tuning fork gyroscope

Indexed keywords

DEEP REACTIVE ION ETCHING (DRIE); HARPSS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); SINGLE CRYSTAL SILICON (SCS); TUNABLE CAPACITORS; TUNING FORK GYROSCOPE;

ACCELEROMETERS; ASPECT RATIO; CAPACITORS; CHEMICAL VAPOR DEPOSITION; ELECTRODES; GYROSCOPES; POLYSILICON; PRESSURE EFFECTS; REACTIVE ION ETCHING; SILICON; SINGLE CRYSTALS;

MICROELECTROMECHANICAL DEVICES;

EID: 21844434732     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.590750     Document Type: Conference Paper

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