Thermal oxidation-induced strain in silicon nanobeams

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 189-192

  Pyzyna, A M ^a   Clarke, D R ^a   MacDonald, N C ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOBEAMS; OXIDATION-INDUCED STRAIN (OIS); OXIDE LAYERS;

INTERFEROMETRY; MATHEMATICAL MODELS; OXIDATION; PHOTOLITHOGRAPHY; SINGLE CRYSTALS; STRAIN; THERMAL EFFECTS;

NANOSTRUCTURED MATERIALS;

EID: 3042704364     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2003.1189718     Document Type: Conference Paper

References (4)

1. B. W. Reed, Unpublished doctoral dissertation, Cornell University, Ithaca, New York (1999).
2. S. P. Timoshenko and J. M. Gere, Theory of Elastic Stability, McGraw-Hill Book Company, Inc., New York, 1963.
3. S.M. Hu: J. Appl. Phys. 45, 1567 (1974).
4. D. Skarlatos, M. Omri, A. Claverie and D. Tsoukalas: J. Electrochem. Soc. 146, 2276 (1999).