Thickness-dependent stress in plasma-deposited silicon dioxide films

Journal of Applied Physics

Volumn 97, Issue 8, 2005, Pages

  Au, V ^a   Charles, C ^a   Bulla, D A P ^a   Love, J D ^a   Boswell, R W ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BUFFER LAYERS; FILM DEPOSITION; HELICON ACTIVATED REACTIVE EVAPORATION (HARE); WAVEGUIDE FABRICATION;

BIREFRINGENCE; COALESCENCE; ELECTRON BEAMS; EVAPORATION; FILM GROWTH; INTERFACES (MATERIALS); NANOSTRUCTURED MATERIALS; OPTICAL WAVEGUIDES; PHOTOLUMINESCENCE; SILICA;

THICK FILMS;

EID: 21444432726     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1870116     Document Type: Article

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