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Diamond and Related Materials

Volumn 14, Issue 9, 2005, Pages 1517-1521

Gas composition at the substrate in MW-CVD diamond growth: An old problem revisited

(2) Kovats A a Deak P a,b

a BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS (Hungary)

b UNIVERSITY OF PADERBORN (Germany)

Author keywords

Diamond CVD; Mass spectrometry; MW plasma composition; Radicals

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL GROWTH; MASS SPECTROMETRY; MICROWAVES; PLASMA THEORY; SAMPLING; SUBSTRATES;

DIAMOND CVD; MW PLASMA COMPOSITION; RADICALS; REACTION CHAMBERS;

DIAMOND FILMS;

EID: 21344463835 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/j.diamond.2005.04.003 Document Type: Article

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.