Mass spectrometric studies of a CH4/H2microwave plasma under diamond deposition conditions

Journal of Applied Physics

Volumn 89, Issue 5, 2001, Pages 2543-2546

  Fujii, Toshihiro ^a   Kareev, Michael ^a  

^a NATIONAL INSTITUTE FOR ENVIRONMENTAL STUDIES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011693246     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1346655     Document Type: Article

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