Ion beam mass spectrometer for compositional analysis of plasma assisted surface processes in the pressure range of 1-50 mbar

Review of Scientific Instruments

Volumn 70, Issue 8, 1999, Pages 3324-3328

  Katai Sz ^a   Tass, Z ^a   Bori, L ^a   Hars Gy ^a   Deak P ^a   Geelhaar, L ^b  

^a TU Institute of Building Constructions and Sanitary Engineering Budapest   (Hungary)

^b FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; ION BEAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SUBSTRATES;

ION BEAM MASS SPECTROMETER (IBMS); PLASMA SAMPLING SYSTEMS; QUADRUPOLE MASS SPECTROMETER (QMS);

MASS SPECTROMETERS;

EID: 0043217147     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1149912     Document Type: Article

References (7)

1. W. L. Hsu and D. M. Tung, Rev. Sci. Instrum. 63, 4138 (1992).
2. H. W. Drawin, Mass Spectrometry of Plasmas in Plasma Diagnostics (AIP, New York, 1995).
3. P. Awakowicz, R. Schwefel, M. Werder, and W. Kasper, Diamond Relat. Mater. 6, 1816 (1997).
4. Z. Tass, Ph.D. dissertation.
5. Gy. Hárs, A. Sólyom, and J. Giber, Fresenius J. Anal. Chem. 341, 57 (1991).
6. Secondary Ion Mass Spectrometry, edited by A. Benninghoven, F. G. Rüdenauer, and H. W. Werner (Wiley, New York, 1987).
7. M. C. McMaster et al., Diamond Relat. Mater. 4, 1000 (1995).