Spatially resolved optical emission spectroscopy of the secondary glow observed during biasing of a microwave plasma

Vacuum

Volumn 56, Issue 1, 2000, Pages 15-23

  Whitfield, Michael D ^a   Jackman, Richard B ^a   Foord, J S ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DIAMOND FILMS; ELECTRIC CURRENT MEASUREMENT; EMISSION SPECTROSCOPY; ETCHING; GLOW DISCHARGES; MICROWAVES; NUCLEATION; PHOTOGRAPHY; VOLTAGE MEASUREMENT;

BIASED ENHANCED NUCLEATION (BEN); MICROWAVE-ENHANCED PLASMA CHEMICAL VAPOR DEPOSITION (MEPCVD);

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0033895471     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(99)00174-8     Document Type: Article

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