Spectroscopic study of the decomposition process of tetramethylsilane in the N2-H2 and N2-Ar low pressure plasma

Diamond and Related Materials

Volumn 14, Issue 9, 2005, Pages 1498-1507

  Jamroz, P ^a   Zyrnicki, W ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Optical emission spectroscopy; Organosilicon compound; Plasma CVD; SiCN layers

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; EMISSION SPECTROSCOPY; MIXTURES; NITROGEN; PLASMA THEORY; THIN FILMS;

OPTICAL EMISSION SPECTROSCOPY; ORGANOSILICON COMPOUNDS; PLASMA CHEMICAL VAPOR DEPOSITION; SICN LAYERS;

SILICON COMPOUNDS;

EID: 21344447934     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.03.008     Document Type: Article

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