Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy

Applied Physics Letters

Volumn 86, Issue 16, 2005, Pages 1-3

  Jan, J C ^a   Babu, P D ^a,d   Tsai, H M ^a   Pao, C W ^a   Chiou, J W ^a   Ray, S C ^a   Kumar, K P Krishna ^a   Pong, W F ^a   Tsai, M H ^b   Jong, C A ^c   Chin, T S ^c  

^a TAMKANG UNIVERSITY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^d UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTROMIGRATION; REFRACTIVE INDEX; RESIDUAL STRESSES; THERMODYNAMIC STABILITY; THIN FILMS;

DEVICE FAILURE; MULTIELECTRON EXCITATIONS; X-RAY ABSORPTION NEAR-EDGE STRUCTURE (XANES); X-RAY ABSORPTION SPECTROSCOPY;

TANTALUM COMPOUNDS;

EID: 20844437904     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1905784     Document Type: Article

References (23)

1. T. Nitta, T. Ohmi, S. Skai, and T. Shibata, J. Electrochem. Soc. 140, 1131 (1993).
2. A. E. Kaloyeros, X. Chen, S. Lane, H. L. Frisch, and B. Arkles, J. Mater. Res. 15, 2800 (2000).
3. J. S. Park, H. S. Park, and S. W. Kang, J. Electrochem. Soc. 149, 28 (2002).
4. T. Takeyama, A. Noya, T. Sase, and A. Ohta, J. Vac. Sci. Technol. B 14, 674 (1996).
5. J. O. Olowolafe, J. Li, J. W. Mayer, and E. G. Golgan, Appl. Phys. Lett. 58, 469 (1991).
6. M. Stavrev, D. Fischer, C. Wenzel, and T. Heiser, Microelectron. Eng. 37-38, 245 (1997).
7. M. Stavrev, D. Fischer, C. Wenzel, K. Drescher, and N. Mattern, Thin Solid Films 307, 79 (1997).
8. M. H. Tsai, S. C. Sun, H. T. Chin, C. E. Tsai, and S. H. Chuang, Appl. Phys. Lett. 67, 1128 (1995).
9. C. C. Chang, J. S. Jeng, and J. S. Chen, Thin Solid Films 413, 46 (2002).
10. C. A. Jong, T. S. Chin, and W. Fang, Thin Solid Films 401, 291 (2001).
11. C. A. Jong and T. S. Chin, Mater. Chem. Phys. 74, 201 (2002).
12. A. Yagishita, H. Maezawa, M. Ukai, and E. Shigemasa, Phys. Rev. Lett. 62, 36 (1989).
13. J. Stöhr, NEXAFS Spectroscopy, Springer Series in Surface Science Vol. 25 (Springer, New York, 1992).
14. L. Wenzel, D. Arvanities, R. Schlogl, M. Muhler, D. Norman, K. Baberschke, and G.. Ertl, Phys. Rev. B 40, 6409 (1989).
15. J. Stöhr, K. Baberschke, R. Jaeger, R. Treichler, and S. Brennan, Phys. Rev. Lett. 47, 381 (1981).
16. L. Soriano, M. Abbate, J. C. Fuggle. M. A. Jimenez, J. M. Sanz, C. Mythen, and H. A. Padmore, Solid State Commun. 87, 699 (1993).
17. CRC Handbook of Chemistry and Physics, 81st ed., edited by, D. R. Lide, (CRC Press, Boca Raton, FL, 2000-2001).
18. J. G. Chen, Surf. Sci. Rep. 30, 1 (1997).
19. F. M. F. de Groot, M. Grioni, J. C. Fuggle, J. Ghijsen, G. A. Sawatzky, and H. Petersen, Phys. Rev. B 40, 5715 (1989).
20. P. S. P. Wei and F. W. Lytle, Phys. Rev. B 19, 679 (1979);
21. G. Meitzner, G. H. Via, F. W. Lytle, and J. H. Sinfelt, J. Phys. Chem. 96, 4960 (1992).
22. A. O. Ibidunni, R. L. Masaties, R. L. Opila, A. J. Davenport, H. S. Isaacs, and J. A. Tayor, Surf. Interface Anal. 20, 559 (1993).
23. A. Fernandez, A. Caballero, V. Jimenez, J. C. Sanchez, A. R. Gonzalez-Elipe, F. Alonso, and J. I. Onate, Surf. Coat. Technol. 83, 109 (1996).