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Volumn 86, Issue 21, 2005, Pages 1-13
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Enhanced stress relaxation in ultrathin SiGe-on-insulator by H+ -implantation-assisted oxidation
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Author keywords
[No Author keywords available]
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Indexed keywords
CONDENSATION;
ELECTRIC INSULATORS;
ION IMPLANTATION;
IRRADIATION;
OXIDATION;
STRESS RELAXATION;
ENHANCED STRESS RELAXATION;
IRRADIATION DEFECTS;
SIGE-ON-INSULATORS;
VIRTUAL SUBSTRATES;
SILICON COMPOUNDS;
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EID: 20844434633
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1935028 Document Type: Article |
Times cited : (15)
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References (13)
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