Development of EUV light source by CO2 laser-produced Xe plasma

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5662, Issue , 2004, Pages 361-366

  Tanaka, H ^a   Akinaga, K ^a   Takahashi, A ^a   Okada, T ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Co2 laser; Extreme ultraviolet; Laser produced plasma; Spectrograph; Xenon

Indexed keywords

CAMERAS; CARBON DIOXIDE; CHARGE COUPLED DEVICES; CHEMICAL LASERS; CRYOGENICS; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; LIGHT SOURCES; PHOTOLITHOGRAPHY; XENON;

CO2 LASER; EXTREME ULTRAVIOLET; FULL WIDTH HALF AT MAXIMUM (FWHM); TRANSMISSION GRATING SPECTROGRAPH (TGS);

ULTRAVIOLET DEVICES;

EID: 20344402552     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.596348     Document Type: Conference Paper

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