Thermal diffusivity measurement of low-k dielectric thin film by temperature wave analysis

Thermochimica Acta

Volumn 432, Issue 2, 2005, Pages 216-221

  Morikawa, Junko ^a   Hashimoto, Toshimasa ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Low k dielectric thin film; Spin coating; Temperature wave analysis; Thermal conductivity; Thermal diffusivity

Indexed keywords

DIELECTRIC FILMS; PERMITTIVITY; RESINS; SILICONES; SPIN COATING; THERMAL CONDUCTIVITY; THERMAL DIFFUSION IN SOLIDS; THERMOSETS;

HYDROGEN-SILSESQUIOXANE (HSQ); LOW-K DIELECTRIC THIN FILMS; TEMPERATURE WAVE ANALYSIS; THERMAL DIFFUSIVITY;

THIN FILMS;

EID: 20344389287     PISSN: 00406031     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tca.2005.04.005     Document Type: Conference Paper

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