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Journal of the Electrochemical Society

Volumn 149, Issue 7, 2002, Pages

Residual crystalline silicon phase in silicon-rich-oxide films subjected to high temperature annealing

(8) Fazio, B a Vulpio, M a Gerardi, C a Liao, Y b Crupi, I b Lombardo, S b Trusso, S b Neri, F c

a STMICROELECTRONICS (Italy)

b CNR (Italy)

c UNIVERSITY OF MESSINA (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRECIPITATION (CHEMICAL); RAMAN SPECTROSCOPY; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

SILICON-RICH-OXIDE (SRO) FILMS;

CRYSTALLINE MATERIALS;

EID: 0036641581 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1479163 Document Type: Article

Times cited : (25)

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