Chemical composition and local structure of plasma enhanced chemical vapor-deposited Si nanodots and their embedding silica matrix

Applied Physics Letters

Volumn 82, Issue 6, 2003, Pages 889-891

  Dalba, G ^a   Daldosso, N ^a   Fornasini, P ^a   Grisenti, R ^a   Pavesi, L ^a   Rocca, F ^b   Franzo G ^c   Priolo, F ^c   Iacona, F ^d  

^a UNIVERSITY OF TRENTO   (Italy)

^b IFN CNR   (Italy)

^c UNIVERSITY OF CATANIA   (Italy)

^d CNR IMM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; AMORPHOUS MATERIALS; COMPOSITION; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; X RAY ANALYSIS;

LOCAL STRUCTURES;

SILICON;

EID: 0037428749     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1543641     Document Type: Article

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