Real time measurement of epilayer strain using a simplified wafer curvature technique

Materials Research Society Symposium - Proceedings

Volumn 405, Issue , 1996, Pages 381-386

  Floro, J A ^a   Chason, E ^a   Lee, S R ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; MOLECULAR BEAM EPITAXY; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; STRAIN MEASUREMENT; STRESS RELAXATION;

EPILAYER STRAIN; WAFER CURVATURE TECHNIQUE;

THIN FILMS;

EID: 0029726330     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)