Development of the point diffraction interferometer for extreme ultraviolet lithography: Design, fabrication, and evaluation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2449-2458

  Otaki, K ^a   Ota, K ^a   Nishiyama, I ^a   Yamamoto, T ^a   Fukuda, Y ^a   Okazaki, S ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ERROR ANALYSIS; ESTIMATION; HELIUM; LITHOGRAPHY; MIRRORS; OPTICAL DESIGN; POLYNOMIALS; REFRACTIVE INDEX; ULTRAVIOLET RADIATION;

ASPHERIC MIRROR MEASUREMENT; ERROR ESTIMATION; EXTREME ULTRAVIOLET LITHOGRAPHY; NUMERICAL APPERTURE; OPTICAL ERROR FACTORS; POINT DIFFRACTION INTERFEROMETER;

INTERFEROMETERS;

EID: 0036883105     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526605     Document Type: Article

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