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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 295-300

Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror

(6) Otaki, K a Yamamoto, T a Fukuda, Y a Ota, K a Nishiyama, I a Okazaki, S a

a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; HELIUM; INTERFEROMETERS; MIRRORS; PHOTOLITHOGRAPHY; TURBULENCE;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

ASPHERICS;

EID: 0036118698 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1445161 Document Type: Article

Times cited : (63)

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