One-level gray-tone design - Mask data preparation and pattern transfer

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 559-562

  Reimer, K ^a   Henke, W ^a   Quenzer, H J ^a   Pilz, W ^a   Wagner, B ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CMOS INTEGRATED CIRCUITS; DATA HANDLING; DATA STRUCTURES; ETCHING; MASKS; MICROELECTRONIC PROCESSING; PHOTORESISTS; PULSE WIDTH MODULATION; SEMICONDUCTING SILICON; THREE DIMENSIONAL; TRANSFER FUNCTIONS;

DATA COMPACTION; DATA PREPARATION; GRAY TONE LITHOGRAPHY; PATTERN TRANSFER; WAFER PROCESSING;

LITHOGRAPHY;

EID: 0029769447     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00309-6     Document Type: Article

References (3)

1. W. Henke, H.J. Quenzer, P. Staudt-Fischbach, B. Wagner Microelectronic Engeneering 27 (1995) 267-270
2. B. Wagner, H.J. Quenzer, W. Henke, W. Hoppe W. Pilz Sensors and Actuators A46-47 (1995) 89-94
3. W. Däschner, M. Larsson, S.H. Lee Applied Optics / Vol. 34, No. 14 / 10 may 1995