Design of hybrid micro optical elements with coded gray-tone mask

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 793-799

  Yao, J ^a   Cui, Z ^a   Gao, F ^a   Zhang, Y ^a   Du, J ^a   Su, J ^a   Guo, Y ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Gray scale photolithography; Hybrid element; Micro optics

Indexed keywords

ABERRATIONS; MASKS; OPTICAL DEVICES; PHOTOLITHOGRAPHY;

CODED GRAY-TONE MASKS;

MICROOPTICS;

EID: 0035450777     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00493-2     Document Type: Article

References (8)