Process development and application of grayscale lithography for efficient three-dimensionally profiled fiber-to-waveguide couplers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5183, Issue , 2003, Pages 123-131

  Dillon, Thomas ^a   Sure, Anita ^a   Murakowski, Janusz ^a   Prather, Dennis ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

Continuous tone mask; Grayscale lithography; HEBS glass; Optical couplers; Tapered couplers

Indexed keywords

BANDWIDTH; COMPUTER SIMULATION; LIGHT PROPAGATION; MICROLENSES; MIRRORS; OPTICAL DEVICES; OPTICAL FIBERS; OPTICAL WAVEGUIDES; PRISMS; SENSITIVITY ANALYSIS; SUBSTRATES;

CONTINOUS-TONE MASK; GRAYSCALE LITHOGRAPHY; HIGH ENERGY BEAM SENSITIVE (HEBS) GLASS; OPTICAL COUPLERS; TAPERED COUPLERS;

LITHOGRAPHY;

EID: 2342656462     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.505834     Document Type: Conference Paper

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