Allowable Substrate Bias for the Etching of n-GaN hi Photo-Enhanced Electrochemical Etching

Physica Status Solidi (A) Applied Research

Volumn 188, Issue 1, 2001, Pages 403-406

  Seo, J W ^a   Oh, C S ^a   Yang, J W ^a   Yang, G M ^a   Lim, K Y ^a   Yoon, C J ^a   Lee, H J ^a  

^a Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1942478635     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(200111)188:1<403::AID-PSSA403>3.0.CO;2-4     Document Type: Article

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