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Journal of Luminescence

Volumn 113, Issue 3-4, 2005, Pages 279-284

Light-emitting Si films formed by neutral cluster deposition in a thin O2 gas

(5) Honda, Y a Takei, M a Ohno, H b Shida, S c Goda, K a

a MEISEI UNIVERSITY (Japan)

b TOKYO NATIONAL COLLEGE OF TECHNOLOGY (Japan)

c IWAKI MEISEI UNIVERSITY (Japan)

Author keywords

Amorphous; Photoluminescence

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; KINETIC ENERGY; LIGHT EMISSION; MATHEMATICAL MODELS; OXYGEN; PHOTOLUMINESCENCE; QUANTUM THEORY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS; LATTICE FRINGES; NEUTRAL CLUSTER DEPOSITION (NCD); QUANTUM CONFINEMENT MODELS;

SILICA;

EID: 19044385388 PISSN: 00222313 EISSN: None Source Type: Journal
DOI: 10.1016/j.jlumin.2004.10.023 Document Type: Article

Times cited : (5)

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