Visible light emission from SiOx films synthesized by laser ablation

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 12 B, 1996, Pages

  Makimura, Tetsuya ^a   Kunii, Yasuhiko ^a   Ono, Naoto ^a   Murakami, Kouichi ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ANNEALING; DEPOSITION; LASER ABLATION; LIGHT EMISSION; NANOSTRUCTURED MATERIALS; OXYGEN; PHOTOLUMINESCENCE; SILICON; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY SPECTROSCOPY;

RED PHOTOLUMINESCENCE; SOFT X RAY ABSORPTION SPECTROSCOPY; VISIBLE LIGHT EMISSION;

SILICA;

EID: 0030410130     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l1703     Document Type: Article

References (20)