Effects of reaction product during hydrogenation of Si surfaces in HF solution

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 3 SUPPL. B, 1998, Pages 1193-1197

  Sugita, Yoshihiro ^a   Watanabe, Satoru ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

H2SiF6; HF; Hydrogen; Hydrophilic; Hydrophobic; Oxidation; Si; SiO2; Solution

Indexed keywords

EID: 0242717294     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.1193     Document Type: Article

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